Beijing Zhongke Yannuo focuses on R&D and supply of high purity advanced metallic materials.
Advanced Materials for Thin Film & Research
High Purity Functional Materials for Lab Research & Thin Film Coating
High-purity metals, alloys and intermetallic compounds are core foundational materials for laboratory research and industrial magnetron sputtering. High purity, precise elemental ratio, controllable morphology and excellent forming performance make them essential raw materials for thin film preparation, new material mechanism exploration and advanced component manufacturing.
- Main Product Forms for Scientific Research & Coating Industry
- Sputtering Targets
- Pure metal targets, alloy targets, compound ceramic targets; customized size, backplate bonding, surface polishing
- Widely used for optical coatings, semiconductor films, conductive layers and corrosion-resistant thin films
- Metal & Alloy Powder
- Elemental powder, multi-component alloy powder, gallium-based compound powder, high entropy alloy powder
- Particle size adjustable, conventional particle size <300μm, available for solid-state reaction, sintering and target blank preparation
- Wire, Foil & Rod
- High-purity thin wire, thin foil, solid rods, available for thermal evaporation, electron beam evaporation and experimental machining
- Granules, Blocks & Ingots
- Diverse specifications for vacuum melting, thermal evaporation and alloy smelting experiments
- High Entropy Alloy Materials
- Equiatomic & non-equiatomic multi-component high entropy alloys, supplied as targets, powder, rods and ingots
- Core Advantages of Our Advanced Functional Materials
- Precise Composition Control: Strict batching and smelting technology guarantee stable element proportion, consistent experimental repeatability batch by batch
- Controllable Purity Grades: Products cover 3N~6N purity grades, ultra-low single impurity content to satisfy strict laboratory standards
- Flexible Customization: Atomic ratio, dimension, particle size and shape can be customized according to customer drawings and experimental schemes
- Low Defect Microstructure: Dense, uniform internal structure, effectively reduce particle drop and arcing during sputtering deposition
- Wide Application Compatibility: Compatible with magnetron sputtering, thermal evaporation, powder metallurgy, additive manufacturing and various material testing platforms
- Complete Technical Support: COA test certificates can be provided; professional technical team offers material selection guidance for thin film research