75.04Ni14.05Al10.41Cr0.5Hf High Entropy Alloy Sputtering Target is a custom multi‑principal‑element Ni‑Al‑Cr‑Hf alloy target material for magnetron sputtering and PVD thin‑film deposition. As a professional manufacturer of advanced sputtering targets, we fabricate this HEA target with strictly controlled atomic ratio: 75.04at% Ni,14.05at% Al,10.41at% Cr, 0.5at% Hf. Custom dimensions, shapes including circular, rectangular and rotary target can be processed according to customer drawings.
This 75.04Ni14.05Al10.41Cr0.5Hf high entropy alloy sputtering target combines the advantages of nickel‑aluminum base alloy plus chromium and hafnium doping. It features uniform internal microstructure, low impurity content, high density and good sputtering consistency. The addition of trace hafnium improves high‑temperature stability, oxidation resistance and thin‑film comprehensive performance of deposited coatings.
Our 75.04Ni14.05Al10.41Cr0.5Hf HEA sputtering target is widely used for PVD hard‑coating deposition, thin‑film material research, surface modification, functional film preparation and related new‑material development fields. Bonding service with copper back‑plate is available upon request to meet magnetron sputtering working requirements.
Every batch of 75.04Ni14.05Al10.41Cr0.5Hf high entropy alloy sputtering target goes through strict composition testing, density inspection and microstructure analysis before delivery. We support laboratory small‑order samples as well as industrial‑volume bulk supply. Related technical documents such as inspection report and MSDS can be provided. Whether for academic laboratory research or industrial thin‑film production, our custom HEA sputtering target can satisfy your strict technical requirements.
