AlCoCrFeNi High Entropy Alloy Sputtering Target, Custom Atomic Ratio HEA Target Manufacturer

AlCoCrFeNi High Entropy Alloy Sputtering Target is a typical multi-principal-element HEA target material widely used for advanced thin film coating and material innovation. Our factory specializes in producing high-performance AlCoCrFeNi alloy targets with custom adjustable atomic ratio to meet different experimental and industrial technical requirements.
Different from fixed-composition alloy targets, this series supports personalized formula adjustment. Customers can customize the atomic proportion of aluminum, cobalt, chromium, iron and nickel according to their coating process, film performance standards and experimental schemes. The finished target features uniform microstructure, high density, low impurity and stable sputtering performance, ensuring consistent thin film quality during PVD and magnetron sputtering deposition.
AlCoCrFeNi HEA sputtering targets possess excellent comprehensive properties including high hardness, good oxidation resistance, outstanding wear resistance and stable high-temperature performance. They are widely applied in functional thin film preparation, mechanical part surface strengthening, corrosion-resistant coating, semiconductor research and new energy material development.
We provide full customized services including adjustable atomic ratio, custom size, shape, surface treatment and copper backplate bonding. Each batch is strictly tested for composition uniformity and density. Stable bulk supply and small-batch sample support are available for global customers.

High Purity:

Multiple purity grades available: 3N / 4N / 5N / 6N (99.9% ~ 99.9999%), ultra-low impurity content, stable and consistent material performance.

Excellent Electrical & Thermal Conductivity

Outstanding electric and thermal conductivity, widely applied in electronics, heat sinks, batteries, conductive components, semiconductor, sputtering targets and heat dissipation fields.

Mirror Smooth Surface Finish

Flat, polished, contamination-free surface, greatly improves follow-up coating, welding, cutting and other secondary processing effects.

Advantage

High Ductility & Malleability

Superior forming performance, easy to bend, stamp, roll without cracking during processing.

Superior Corrosion Resistance

Stable anti-corrosion property under diverse working environments, guarantees long service life for industrial scenarios.

Versatile Custom Processing

Supports cutting, bending, stamping, CNC machining and size customization as per client’s technical drawings and requirements.

Customers' comments on

Targets, Powder, Foil, Wire, Rod & Profiles

We specialize in advanced new materials with 100,000+ stock SKUs, custom R&D and OEM processing. Full production lines from smelting to precision machining support small & non-standard orders. We fabricate targets, powder, foil, wire, rod and profiles of almost all safe elemental, alloy, compound and composite materials, featuring high purity, great conductivity, smooth surface, good ductility, corrosion resistance and flexible processing.

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