FeCoCrNiMn high entropy alloy sputtering target is a multi-principal-element HEA material for magnetron sputtering and PVD thin film deposition. We support custom atomic ratio to meet your lab research and industrial coating requirements. The target boasts high density, uniform grain structure and stable sputtering performance, widely used in surface engineering, functional film preparation and material science studies.
FeCoCrNiMn High Entropy Alloy Target | Custom Atomic Ratio
High Purity:
Multiple purity grades available: 3N / 4N / 5N / 6N (99.9% ~ 99.9999%), ultra-low impurity content, stable and consistent material performance.
Excellent Electrical & Thermal Conductivity
Outstanding electric and thermal conductivity, widely applied in electronics, heat sinks, batteries, conductive components, semiconductor, sputtering targets and heat dissipation fields.
Mirror Smooth Surface Finish
Flat, polished, contamination-free surface, greatly improves follow-up coating, welding, cutting and other secondary processing effects.
Advantage
High Ductility & Malleability
Superior forming performance, easy to bend, stamp, roll without cracking during processing.
Superior Corrosion Resistance
Stable anti-corrosion property under diverse working environments, guarantees long service life for industrial scenarios.
Versatile Custom Processing
Supports cutting, bending, stamping, CNC machining and size customization as per client’s technical drawings and requirements.
Customers' comments on
Targets, Powder, Foil, Wire, Rod & Profiles
We specialize in advanced new materials with 100,000+ stock SKUs, custom R&D and OEM processing. Full production lines from smelting to precision machining support small & non-standard orders. We fabricate targets, powder, foil, wire, rod and profiles of almost all safe elemental, alloy, compound and composite materials, featuring high purity, great conductivity, smooth surface, good ductility, corrosion resistance and flexible processing.
